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re-usable CHARM-2 wafer
feedback in less than 20 minutes
minimum detectable charge 2.5 x 10
coul/cm
run process
plasma etching : poly,oxide and metal
resist ashing
plasma deposition
sputter clean
spin rinsing
ion implanter
#403,Kunyoung Town,2006-1,Juckjeon-dong,Suji-gu,Yongin-si,Kyunggi-do,448-160,Korea Tel:82-31-889-8985(rep,) Fax:82-31-889-8987
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coul/cm
